Kuroishi, Japan

Kenji Narita

This inventor holds 1 USPTO granted patent. Top assignee: Adamant Namiki Precision Jewel Co., Ltd.. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kenji Narita. Retrieved from https://idiyas.com/inventor/kenji-narita-upwfl719

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 4.0

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Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Kenji Narita: Innovator in Optical Measurement Technology

Introduction

Kenji Narita is a prominent inventor based in Kuroishi, Japan. He is known for his innovative contributions to optical measurement technology. His work has significantly impacted the field, particularly in the development of devices that enhance measurement accuracy.

Latest Patents

Kenji Narita holds a patent for an optical inner surface measurement device. This device includes a motor, a rotary optical fiber, a fixed optical fiber, and a runout detection sensor. The design allows for precise measurement of the inner surfaces of objects by analyzing reflected light captured from the measurement target. The inner surface measurement data is corrected based on the runout amount detected by the sensor, ensuring high accuracy in measurements.

Career Highlights

Narita is associated with Adamant Namiki Precision Jewel Co., Ltd., where he has made significant contributions to the company's technological advancements. His expertise in optical measurement has positioned him as a key figure in the development of innovative measurement solutions.

Collaborations

Throughout his career, Kenji Narita has collaborated with notable colleagues, including Hiroshi Yamazaki and Takuya Tateyama. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Kenji Narita's work in optical measurement technology exemplifies the spirit of innovation. His contributions continue to influence the industry, showcasing the importance of precision in measurement devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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