Tokyo, Japan

Kenji Iijima

This inventor holds 1 USPTO granted patent. Top assignees: Adeka Argus Chemical Co., Ltd., Du Pont-Showa Denko Co., Ltd.. Active years: 1990.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kenji Iijima. Retrieved from https://idiyas.com/inventor/kenji-iijima-4uxxcfos

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 1990

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1 patent (USPTO):Explore Patents

Title: Kenji Iijima: Innovator in Chloroprene Rubber Technology

Introduction

Kenji Iijima is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of materials science, particularly in the development of plasticizers for chloroprene rubber. His innovative work has implications for various industrial applications.

Latest Patents

Kenji Iijima holds a patent for a plasticizer for chloroprene rubber and plasticized chloroprene rubber. This patent is represented by the general formula (I) and showcases his expertise in enhancing the properties of chloroprene rubber, making it more versatile for different uses.

Career Highlights

Throughout his career, Iijima has worked with prominent companies such as Du Pont-Showa Denko Co., Ltd. and Adeka Argus Chemical Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to advancements in chemical engineering and materials science.

Collaborations

Iijima has collaborated with esteemed colleagues, including Hiroshi Hondou and Yasushi Hirose. These partnerships have fostered a creative environment that has led to innovative solutions in the field of rubber technology.

Conclusion

Kenji Iijima's work in developing plasticizers for chloroprene rubber highlights his role as a key innovator in materials science. His contributions continue to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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