Yamagata, Japan

Kenji Goto

This inventor holds 1 USPTO granted patent. Top assignee: Agc Inc.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kenji Goto. Retrieved from https://idiyas.com/inventor/kenji-goto-hlid59bm

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Kenji Goto: Innovator in Glass Substrate Technology

Introduction

Kenji Goto is a notable inventor based in Yamagata, Japan. He has made significant contributions to the field of semiconductor manufacturing through his innovative patent. His work focuses on enhancing the efficiency and effectiveness of glass substrates used in semiconductor devices.

Latest Patents

Kenji Goto holds a patent for a glass substrate and method for manufacturing a glass substrate. This invention is crucial for the appropriate manufacturing of semiconductor devices. The patent describes a glass substrate designed to support various positions while ensuring optimal performance in semiconductor applications. Specifically, it outlines a method where the lowest point on the substrate is strategically positioned to enhance manufacturing processes.

Career Highlights

Kenji Goto is associated with AGC Inc., a leading company in glass and materials technology. His role at AGC Inc. allows him to leverage his expertise in developing advanced materials for semiconductor applications. His innovative approach has positioned him as a key figure in the industry.

Collaborations

Kenji Goto collaborates with Yuha Kobayashi, a fellow innovator in the field. Their partnership exemplifies the importance of teamwork in driving technological advancements.

Conclusion

Kenji Goto's contributions to glass substrate technology are invaluable to the semiconductor industry. His innovative patent and collaboration with other experts highlight his commitment to advancing manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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