This inventor holds 1 USPTO granted patent. Top assignee: Kokusai Electric Co., Ltd.. Active years: 2002.
Company Filing History:
Years Active: 2002
Title: Kenji Etoh: Innovator in Substrate Processing Technology
Introduction
Kenji Etoh is a prominent inventor based in Tokyo, Japan. He is known for his contributions to substrate processing technology, particularly through his innovative patent that enhances the efficiency of plasma confinement.
Latest Patents
Kenji Etoh holds a patent for a substrate processing apparatus. This apparatus features an outer tank, an inner tank, and opposed electrodes. The design allows for the distance between the opposed electrodes to be adjusted while ensuring that the inner tank can completely confine plasma. The inner tank is constructed from two constituent members, which work together to establish a state of complete plasma confinement.
Career Highlights
Throughout his career, Kenji Etoh has made significant strides in the field of substrate processing. His work has been instrumental in advancing technologies that are crucial for various applications in electronics and materials science. He is currently associated with Kokusai Electric Co., Ltd., where he continues to innovate and develop new technologies.
Collaborations
Kenji Etoh collaborates with various professionals in his field, including his coworker Satohiro Okayama. Their combined expertise contributes to the advancement of substrate processing technologies.
Conclusion
Kenji Etoh's innovative work in substrate processing technology exemplifies the impact of dedicated inventors in the field. His patent for a substrate processing apparatus showcases his commitment to enhancing technological efficiency.