Yokosuka, Japan

Kenichirou Hatayama

This inventor holds 1 USPTO granted patent. Top assignee: Fuji Photo Film Company, Limited. Active years: 2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kenichirou Hatayama. Retrieved from https://idiyas.com/inventor/kenichirou-hatayama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: Kenichirou Hatayama: Innovator in Curable Compositions

Introduction

Kenichirou Hatayama is a notable inventor based in Yokosuka, Japan. He has made significant contributions to the field of materials science, particularly in the development of curable compositions. His work has implications for various applications, enhancing the functionality and durability of products.

Latest Patents

Kenichirou holds a patent for a "Curable composition and hardcoated article employing same." This innovation showcases his expertise in creating materials that can withstand various environmental conditions while maintaining their integrity.

Career Highlights

Kenichirou Hatayama is associated with Fuji Photo Film Company, Limited, where he has been instrumental in advancing the company's research and development efforts. His work has contributed to the company's reputation for innovation in imaging and materials technology.

Collaborations

Throughout his career, Kenichirou has collaborated with talented individuals such as Seiya Sakurai and Yuuzou Muramatsu. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Kenichirou Hatayama's contributions to the field of curable compositions highlight his role as an innovator in materials science. His patent and collaborations reflect a commitment to advancing technology and improving product performance.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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