Chiba, Japan

Kenichiro Hirai


Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 12(Granted Patents)


Location History:

  • Sakura, JP (1987)
  • Chiba, JP (1992)

Company Filing History:


Years Active: 1987-1992

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2 patents (USPTO):Explore Patents

Title: Kenichiro Hirai: Innovator in Adhesive Technology

Introduction

Kenichiro Hirai is a notable inventor based in Chiba, Japan. He has made significant contributions to the field of adhesive technology, particularly through his innovative work with .alpha.-cyanoacrylate adhesives. With a total of 2 patents to his name, Hirai continues to push the boundaries of adhesive applications.

Latest Patents

Hirai's latest patents focus on advanced .alpha.-cyanoacrylate adhesive compositions. The first patent describes an adhesive composition consisting of 100 weight parts of .alpha.-cyanoacrylate and 0.01 to 0.1 weight parts of a specific compound. This innovative formulation shortens the adhesive's set time and enhances adhesion strength, even on acidic or drying surfaces. The second patent presents another .alpha.-cyanoacrylate adhesive composition that includes fumed silica treated with dimethyldichlorosilane and trialkyl borate. This composition improves thixotropy and stability, addressing previous workability issues associated with conventional adhesives.

Career Highlights

Kenichiro Hirai is associated with Koatsu Gas Kogyo Co., Ltd., where he applies his expertise in adhesive technology. His work has led to advancements that benefit various industries relying on effective bonding solutions.

Collaborations

Hirai collaborates with talented individuals such as Toshio Sugimae and Mitsuyuki Koga. Their combined efforts contribute to the innovative developments in adhesive formulations.

Conclusion

Kenichiro Hirai's contributions to adhesive technology, particularly in .alpha.-cyanoacrylate compositions, showcase his innovative spirit and dedication to improving adhesive performance. His work continues to influence the industry and pave the way for future advancements.

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