Hiratsuka, Japan

Kenichi Otani

This inventor holds 1 USPTO granted patent. Top assignee: The Furukawa Electric Co., Ltd.. Active years: 1990.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kenichi Otani. Retrieved from https://idiyas.com/inventor/kenichi-otani-vv0g0hr2

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 1990

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1 patent (USPTO):Explore Patents

Title: Kenichi Otani: Innovator in Electromagnetic Wave Shielding

Introduction

Kenichi Otani is a notable inventor based in Hiratsuka, Japan. He has made significant contributions to the field of electromagnetic wave shielding materials. His innovative work has led to the development of a patented technology that addresses important challenges in this area.

Latest Patents

Kenichi Otani holds a patent for "Pellets for making electromagnetic wave shielding material and method." This invention showcases his expertise and commitment to advancing technology in electromagnetic wave protection.

Career Highlights

Otani is associated with The Furukawa Electric Co., Ltd., a company known for its advancements in electrical and electronic materials. His role there has allowed him to contribute to various projects that enhance the performance and safety of electronic devices.

Collaborations

Throughout his career, Kenichi has collaborated with talented individuals such as Izumi Kosuga and Kazuaki Matsumuto. These partnerships have fostered innovation and have been instrumental in the development of new technologies.

Conclusion

Kenichi Otani's work in electromagnetic wave shielding exemplifies the impact of dedicated inventors in the technology sector. His contributions continue to influence advancements in materials science and electronic safety.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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