Kenichi Orui

Title: Kenichi Orui: Innovator in Semiconductor Polishing Technologies

Introduction

Kenichi Orui is a notable inventor based in Atsugi, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the polishing processes of substrates. His innovative work has led to the development of a unique method that enhances the efficiency of semiconductor manufacturing.

Latest Patents

Kenichi Orui holds a patent for "Periodic acid compositions for polishing ruthenium/low K substrates." This patent describes a method of polishing a semiconductor substrate surface that features at least one ruthenium element and one dielectric material. The process involves using an aqueous composition containing periodic acid, silica abrasive, and an amine to adjust the pH. The remarkable aspect of this invention is its ability to achieve a removal selectivity of ruthenium to low-K dielectric greater than 20:1, making it a highly effective solution in semiconductor polishing.

Career Highlights

Kenichi Orui is associated with DuPont Air Products Nanomaterials, LLC, where he has been instrumental in advancing semiconductor polishing technologies. His work has not only contributed to the efficiency of manufacturing processes but has also positioned his company as a leader in the field.

Collaborations

Throughout his career, Kenichi has collaborated with esteemed colleagues, including Robert J. Small and Haruki Nojo. These partnerships have fostered innovation and have been pivotal in the development of advanced materials and processes in the semiconductor industry.

Conclusion

Kenichi Orui's contributions to semiconductor polishing technology exemplify the impact of innovative thinking in the field. His patent and work at DuPont Air Products Nanomaterials, LLC highlight the importance of advancements in manufacturing processes.