Kyoto, Japan

Kenichi Onishi

This inventor holds 1 USPTO granted patent. Top assignee: Levex Corporation. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kenichi Onishi. Retrieved from https://idiyas.com/inventor/kenichi-onishi-iybysyup

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Kenichi Onishi: Innovator in Measuring Technology

Introduction

Kenichi Onishi is a notable inventor based in Kyoto, Japan. He has made significant contributions to the field of measuring technology, particularly through his innovative patent.

Latest Patents

Kenichi Onishi holds a patent for a measuring apparatus. This apparatus includes a sensor unit with a coil and a conductive cylinder, designed to vary the area of an overlap zone as the position of an object changes. The device also features a capacitor and a resistor forming a series circuit with the coil, a voltage applier that applies an input voltage, a phase detector for detecting the phase of a voltage across the capacitor, and a magnitude detector for measuring the voltage's magnitude. The apparatus is capable of calculating temperature and area based on feature data that associates phase, magnitude, temperature, and overlap zone area.

Career Highlights

Kenichi Onishi is currently employed at Levex Corporation, where he continues to develop and refine his innovative technologies. His work has garnered attention for its practical applications in various industries.

Collaborations

Kenichi collaborates with his coworker, Kenji Yamamoto, to enhance the capabilities and applications of their inventions.

Conclusion

Kenichi Onishi's contributions to measuring technology exemplify the spirit of innovation. His patent reflects a commitment to advancing the field and improving measurement accuracy.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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