Ebina, Japan

Kenichi Ohno

This inventor holds 1 USPTO granted patent. Top assignee: Fujifilm Business Innovation Corp.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kenichi Ohno. Retrieved from https://idiyas.com/inventor/kenichi-ohno-nf65fxxc

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Kenichi Ohno: Innovator in Light Emitting Technology

Introduction

Kenichi Ohno is a notable inventor based in Ebina, Japan. He has made significant contributions to the field of optical technology, particularly through his innovative designs in light emitting elements.

Latest Patents

Ohno holds a patent for a "Light Emitting Element Array and Optical Measuring System." This invention features a light emitting element array that includes a group of light emitting elements and corresponding lenses. The lenses are designed to deflect light emitted from the elements based on their positional relationships. Notably, the distances between the central axes of the light emitting elements and the lenses increase from the center to the end of the element group, with a decreasing degree of change in these distances.

Career Highlights

Kenichi Ohno is associated with Fujifilm Business Innovation Corporation, where he continues to develop and refine his inventions. His work has been instrumental in advancing optical measurement systems.

Collaborations

Ohno has collaborated with esteemed colleagues such as Shigetoshi Nakamura and Michiaki Murata, contributing to a dynamic environment of innovation and creativity.

Conclusion

Kenichi Ohno's contributions to light emitting technology exemplify the spirit of innovation in the field. His patent and collaborative efforts highlight the importance of teamwork in advancing technological frontiers.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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