Kenichi Ito

Title: **Kenichi Ito: Innovator in Substrate Treatment Technology**

Introduction

Kenichi Ito, an inventive mind based in Kyoto, Japan, holds a notable patent that reflects his contributions to substrate treatment technology. His work signifies an important advancement in the field, making processes more efficient and effective.

Latest Patents

Kenichi Ito is credited with a single patent titled "Substrate Treatment Apparatus and Substrate Treatment Method". This innovative method comprises several steps: a rinsing step where the substrate undergoes treatment with a rinse liquid, followed by an immersing step in diluted isopropyl alcohol (dIPA) from a treatment tank. Additionally, a first isopropyl alcohol treatment step is performed after immersion, concluding with a water-repellent treatment step to enhance the substrate's characteristics.

Career Highlights

Kenichi Ito is affiliated with Screen Holdings Co., Ltd., a company recognized for its significant contributions to technology and manufacturing processes. His work at Screen Holdings demonstrates his commitment to improving substrate treatment methodologies, showcasing his innovative capabilities in a competitive industry.

Collaborations

During his career, Kenichi has collaborated with notable colleagues, including Shigeru Yamamoto and Daiki Fujii. These partnerships highlight the collaborative effort that often drives innovation forward, allowing ideas to develop and refine in a team environment.

Conclusion

Kenichi Ito's patent in substrate treatment technology represents a valuable contribution to the field, showcasing his innovative approach to complex processes. His work at Screen Holdings Co., Ltd., along with significant collaborations, positions him as a key player in advancing technology within the industry. As innovative minds like Ito continue to forge ahead, the potential for new inventions and methodologies remains vast.