Ishikawa, Japan

Kenichi Ishikawa


Average Co-Inventor Count = 4.4

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2019

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2 patents (USPTO):Explore Patents

Title: Kenichi Ishikawa: Innovator in Polishing Technology

Introduction

Kenichi Ishikawa, an accomplished inventor based in Ishikawa, Japan, has made significant contributions to the field of polishing technology. With two registered patents to his name, Ishikawa has developed innovative methods that enhance the efficiency and effectiveness of polishing processes.

Latest Patents

Ishikawa's latest patents include the "Method of Polishing Work" and the "Method of Dressing Polishing Pad." The first patent involves a systematic approach to obtaining correlation data between surface properties of the polishing pad and polishing effects. This method involves determining optimal dressing conditions for achieving desired polishing results, cleaning the polishing pad after use, and measuring its surface properties.

The second patent introduces a comprehensive polishing apparatus featuring multiple sections, including a dressing section for the polishing pad, measuring sections for assessing surface properties and polishing results, and a data storage section that utilizes artificial intelligence to learn from previous dressing conditions and polishing outcomes. The AI-driven process allows for accurate estimations of surface properties and predictions of dressing conditions needed for achieving specific polishing results.

Career Highlights

Kenichi Ishikawa has worked with notable companies, including Fujikoshi Machinery Corporation and Kanazawa Institute of Technology. His experience in these organizations has contributed to his expertise in polishing technology and the development of his patented methods.

Collaborations

Throughout his career, Ishikawa has collaborated with skilled professionals, including coworkers Kazutaka Shibuya and Yoshio Nakamura. These collaborations have likely played a critical role in advancing his innovative ideas and refining his inventions.

Conclusion

Kenichi Ishikawa stands out as a prominent inventor in the polishing technology sector. His patents reflect his dedication to improving industrial processes through innovation and technology. As he continues to refine his methods and explore new ideas, his contributions will likely have a lasting impact on the industry.

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