Location History:
- Asaka, JP (1999)
- Asaki, JP (2000)
- Tokyo, JP (1988 - 2003)
Company Filing History:
3 out of 1,767 
3 out of 16,458 
1 out of 24 Years Active: 1988-2003
Title: Kenichi Hoshi: Innovator in Multilayer Components
Introduction
Kenichi Hoshi is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of multilayer components, particularly in the area of inductive impedance. With a total of seven patents to his name, Hoshi's work has had a notable impact on the industry.
Latest Patents
Hoshi's latest patents include innovative designs for multilayer components that enhance inductive impedance. One of his patents describes a laminate that consists of a plurality of first magnetic substances with high magnetic permeability and a plurality of second magnetic substances with low magnetic permeability or non-magnetic substances. This design allows for the inductance element in each of the first magnetic substances to cause magnetic saturation in response to direct currents of substantially the same magnitude flowing through them. Another patent outlines a similar laminate structure, where the second magnetic substances are arranged to enable the inductance element in each of the first magnetic substances to cause magnetic saturation by direct currents of different magnitudes. This innovation provides a multilayer inductor with optional direct-current characteristics.
Career Highlights
Throughout his career, Kenichi Hoshi has worked with notable companies such as Taiyo Yuden Co., Ltd. and Fuji Photo Film Company, Limited. His experience in these organizations has allowed him to develop and refine his expertise in multilayer components and inductive technologies.
Collaborations
Hoshi has collaborated with talented individuals in his field, including Katsuya Inana and Hideya Maki. These partnerships have contributed to the advancement of his innovative projects and patents.
Conclusion
Kenichi Hoshi is a distinguished inventor whose work in multilayer components has led to significant advancements in inductive impedance technology. His contributions continue to influence the industry and inspire future innovations.