Matsusaka, Japan

Kengo Ohashi

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kengo Ohashi. Retrieved from https://idiyas.com/inventor/kengo-ohashi-y9e9cf1r

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Kengo Ohashi: Innovator in Processing Chamber Technology

Introduction

Kengo Ohashi is a notable inventor based in Matsusaka, Japan. He has made significant contributions to the field of processing chamber technology, particularly with his innovative designs that enhance cleaning processes.

Latest Patents

Ohashi holds a patent for a device known as the Shadow Frame Support. This invention provides a processing chamber equipped with shadow frame supports that effectively direct cleaning gas flow to the corners of the chamber. The design allows for optimal cleaning by ensuring that the cleaning gas is forced into the corners, where it is most needed, while the shadow frame supports do not extend into these areas.

Career Highlights

Kengo Ohashi is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His work focuses on improving the efficiency and effectiveness of processing chambers used in various manufacturing processes.

Collaborations

Throughout his career, Ohashi has collaborated with talented individuals such as Shinobu Abe and Takao Hashimoto. These partnerships have contributed to the advancement of technology in their field.

Conclusion

Kengo Ohashi's innovative contributions, particularly his patent for the Shadow Frame Support, demonstrate his commitment to enhancing processing chamber technology. His work continues to influence the industry and improve manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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