Miyazaki, Japan

Ken Tanaka

This inventor holds 1 USPTO granted patent. Top assignee: Asahi Kasei Kogyo Kabushiki Kaisha. Active years: 2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ken Tanaka. Retrieved from https://idiyas.com/inventor/ken-tanaka-0upk55ge

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: Ken Tanaka: Innovator in Semiconductor Manufacturing

Introduction

Ken Tanaka is a prominent inventor based in Miyazaki, Japan. He has made significant contributions to the field of semiconductor manufacturing. His innovative approach has led to the development of a unique method that enhances the efficiency of semiconductor devices.

Latest Patents

Ken Tanaka holds a patent for a "Method of manufacturing multiple aluminum layers in a semiconductor device." This patent showcases his expertise in creating advanced manufacturing techniques that improve the performance and reliability of semiconductor products. He has 1 patent to his name, reflecting his commitment to innovation in this critical industry.

Career Highlights

Ken Tanaka is currently employed at Asahi Kasei Kogyo Kabushiki Kaisha, a leading company in the materials and chemicals sector. His work at Asahi Kasei has allowed him to collaborate with other talented professionals and contribute to groundbreaking advancements in semiconductor technology.

Collaborations

Throughout his career, Ken has worked alongside notable colleagues such as Toyohiko Kuno and Kenichi Kitamura. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of innovative solutions.

Conclusion

Ken Tanaka is a dedicated inventor whose work in semiconductor manufacturing has made a lasting impact on the industry. His innovative methods and collaborations with esteemed colleagues continue to drive advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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