Tokushima, Japan

Ken Shu

This inventor holds 1 USPTO granted patent. Top assignees: Japan Science and Technology Agency, Otsuka Chemical Co., Ltd.. Active years: 2010.


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Ken Shu: Innovator in Organic Bismuth Compounds

Introduction

Ken Shu is a notable inventor based in Tokushima, Japan. He has made significant contributions to the field of organic chemistry, particularly in the development of organobismuth compounds. His innovative work has led to the filing of a patent that showcases his expertise and creativity in this specialized area.

Latest Patents

Ken Shu holds a patent for an organic bismuth compound, which includes a method for producing the compound, a living radical polymerization initiator, and a method for producing a polymer using the initiator. The organobismuth compound is represented by a specific formula, where R and R' can be C-Calkyl, aryl, substituted aryl, or an aromatic heterocyclic group. This invention highlights the versatility and potential applications of organobismuth compounds in various fields.

Career Highlights

Throughout his career, Ken Shu has worked with prominent organizations such as Otsuka Chemical Co., Ltd. and the Japan Science and Technology Agency. His experience in these companies has allowed him to refine his skills and contribute to groundbreaking research in organic chemistry.

Collaborations

Ken Shu has collaborated with esteemed colleagues, including Shigeru Yamago and Takashi Kameshima. These partnerships have fostered a collaborative environment that encourages innovation and the exchange of ideas.

Conclusion

Ken Shu's contributions to the field of organic chemistry, particularly through his patent on organobismuth compounds, demonstrate his commitment to innovation and research. His work continues to influence the scientific community and pave the way for future advancements in this area.

Profile summary based on public USPTO records.
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