Ken Nauman

Title: Ken Nauman: Innovator in Plasma Processing Technologies

Introduction

Ken Nauman is a notable inventor based in Fort Collins, CO (US), recognized for his contributions to plasma processing technologies. He holds a total of 3 patents, showcasing his innovative approach to enhancing sputtering techniques.

Latest Patents

One of his latest patents involves the RF sputtering of multiple electrodes with optimized plasma coupling through the implementation of capacitive and inductive components. This apparatus is designed to create a vacuum chamber that produces a substantially atmospheric vacuum environment for plasma processing. It includes a radio frequency (RF) power supply located outside the vacuum chamber, an RF matching network operatively coupled to the RF power supply, and multiple electrodes mounted within the chamber. The RF power signals are delivered simultaneously to the electrodes during sputtering operations, enhancing plasma coupling.

Another significant patent by Nauman details methods and apparatus for sputtering using direct current. This invention describes a system where a plasma is generated by connecting multiple electrodes to a current supply. The polarity of voltage applied to the electrodes is periodically reversed, allowing at least one electrode to sputter material onto a substrate. The power applied to the electrodes is modulated to achieve desired deposition characteristics.

Career Highlights

Throughout his career, Ken Nauman has worked with prominent companies such as Advanced Energy Industries, Inc. and Bühler AG. His experience in these organizations has contributed to his expertise in plasma processing and sputtering technologies.

Collaborations

Nauman has collaborated with notable professionals in his field, including Hendrik Walde and David J. Christie. These partnerships have furthered his research and development efforts in innovative plasma technologies.

Conclusion

Ken Nauman's work in plasma processing and sputtering technologies has made a significant impact in the field. His patents reflect a commitment to advancing these technologies, and his collaborations with industry professionals highlight his role as a key innovator.