The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 2025
Filed:
Aug. 07, 2023
Bühler Ag, Uzwil, CH;
Advanced Energy Industries, Inc., Fort Collins, CO (US);
Ken Nauman, Fort Collins, CO (US);
Masahiro Watanabe, Windsor, CO (US);
Sarah Williams, Fort Collins, CO (US);
Michael S. Thornton, Loveland, CO (US);
Michael Meyer, Windsor, CO (US);
Bühler AG, Uzwil, CH;
Advanced Energy Industries, Inc, Fort Collins, CO (US);
Abstract
An apparatus comprises a vacuum chamber configured to produce a substantially atmospheric vacuum environment for plasma processing; a radio frequency (RF) power supply located outside of the vacuum chamber; an RF matching network operatively coupled to the RF power supply; and a plurality of electrodes mounted within the vacuum chamber, the plurality of electrodes configured to receive RF power signals from the RF power supply through the RF matching network. The RF power signals are simultaneously delivered to the plurality of electrodes during a sputtering operation. The plurality of electrodes and a set of electrical components are operative to manage the inductive and capacitive reactance for coupling the RF power signals to provide more desirable plasma coupling during the sputtering operation.