Ken-ichi Natsui

Title: Ken-ichi Natsui: Pioneer in Plasma Technology and Sputtering Apparatus

Introduction

Ken-ichi Natsui, an innovative inventor based in Hitachi, Japan, has made significant contributions to the field of plasma technology and magnetron sputtering. With a portfolio of five patents, his work has advanced the understanding and application of plasma generating apparatuses, enhancing various industrial processes.

Latest Patents

One of his notable inventions is the "Plasma Generating Apparatus," which effectively generates plasma by utilizing electron cyclotron resonance. This apparatus employs strategically arranged permanent magnets to create stronger magnetic fields in the peripheral areas of a plasma chamber compared to its center. Additionally, the design features a gradually increasing cross-sectional area of the plasma chamber, and electrons are introduced into an additional plasma chamber without an applied electric field to produce low-temperature plasma.

Another significant patent is the "Magnetron Sputter Apparatus and Method for Forming Films." Natsui’s invention finely balances the size of the erosion area on the target's surface with the film forming region, establishing a predetermined distance between the target and substrates. This design enables the creation of homogeneous thin films with excellent step coverage and minimal thickness variations across large areas.

Career Highlights

Ken-ichi Natsui has dedicated his career to research and innovation in advanced plasma applications while working at Hitachi, Ltd. His expertise in plasma technology and sputtering processes has paved the way for enhanced manufacturing techniques in various industries, including electronics and materials science.

Collaborations

Throughout his career, Natsui has collaborated with esteemed colleagues such as Tadashi Sato and Osamu Koyanagi. These partnerships have fostered a productive environment for research, facilitating the development of new technologies and refining existing ones in the realm of plasma generation and film deposition.

Conclusion

Ken-ichi Natsui stands out as a prominent inventor whose work in plasma technology and magnetron sputtering has had a lasting impact on the industry. His innovative spirit and commitment to advancement continue to inspire future generations of inventors and researchers in the field.