The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 1992
Filed:
Apr. 07, 1988
Yoshimi Hakamata, Hitachi, JP;
Ken-ichi Natsui, Hitachi, JP;
Yukio Kurosawa, Hitachi, JP;
Tadashi Sato, Mito, JP;
Hiroaki Kojima, Hitachi, JP;
Yasunori Ohno, Hitachi, JP;
Tomoe Kurosawa, Hitachi, JP;
Hi Tachi, Ltd., Tokyo, JP;
Abstract
An apparatus for generating plasma by making use of electron cyclotron resonance employs permanent magnets for forming magnetic fields, and the permanent magnets are arranged in such a manner as to form stronger magnetic fields in peripheral portion of a plasma chamber than in a central portion of the same. in addition, a cross-sectional area of the plasma chamber is gradually increased. Furthermore, electrons are introduced into an additional plasma chamber in which an electric field is not applied so as to generate low-temperature plasma.