This inventor holds 1 USPTO granted patent. Top assignee: Yuho Chemicals Inc.. Active years: 1999.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1999
Title: Ken-ichi Nakamura: Innovator in Floor Polish Composition
Introduction
Ken-ichi Nakamura is a notable inventor based in Tochigi, Japan. He has made significant contributions to the field of floor polish compositions. His innovative approach has led to the development of a unique formulation that enhances the properties of floor polish.
Latest Patents
Ken-ichi Nakamura holds 1 patent for his invention titled "Composition for Floor Polish." This patent describes a two-step process for creating a composition that includes water-borne polyurethane resin. The resin is characterized by having 2-20 acid functional groups per urethane, an acid value of 15-200, and a molecular weight ranging from 10,000 to 1,000,000. The process involves reacting the polyurethane resin with a calcium compound to form chemical crosslinkages, resulting in a superior floor polish with enhanced gloss, recoatability, removability, detergent resistance, wear resistance, and heal mark resistance.
Career Highlights
Ken-ichi Nakamura is associated with Yuho Chemicals Inc., where he has been instrumental in advancing the company's product offerings. His expertise in chemical compositions has positioned him as a key player in the development of innovative floor care solutions.
Collaborations
Throughout his career, Ken-ichi has collaborated with talented individuals such as Tadashi Gomi and Kazunori Nakahara. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.
Conclusion
Ken-ichi Nakamura's contributions to the field of floor polish compositions exemplify the impact of innovative thinking in product development. His patented formulation not only enhances the performance of floor polish but also showcases the potential for advancements in chemical engineering.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile