Company Filing History:
Years Active: 2009
Title: Innovator Spotlight: Ken-ichi Asahi and His Groundbreaking Patent
Introduction: Ken-ichi Asahi, hailing from Imizu-gun, Japan, is an accomplished inventor known for his contributions to the field of pattern exposure technology. With a focus on enhancing the precision of photolithography processes, Asahi has made significant strides in ensuring optimal focus during pattern formation.
Latest Patents: Ken-ichi Asahi holds a notable patent titled "Method for determining focus deviation amount in pattern exposure and pattern exposure method." This innovative method involves the formation of various measurement patterns on a substrate to accurately measure edge inclination amounts. By evaluating these measurements against different focus values, Asahi’s patent enables the calculation of focus deviations, enhancing the reliability of exposure processes in semiconductor manufacturing.
Career Highlights: Throughout his career, Asahi has been associated with Panasonic Corporation, where he has been instrumental in advancing imaging technologies. His expertise in photolithography has positioned him as a key player in the development of precision manufacturing techniques that are pivotal in the electronics industry.
Collaborations: Ken-ichi Asahi’s work has benefitted from collaborations with esteemed colleagues, such as Hirofumi Fukumoto and Naohiko Ujimaru. Together, they have contributed to various projects that emphasize technological advancements in pattern exposure and semiconductor fabrication.
Conclusion: Ken-ichi Asahi’s innovative patent and professional collaborations illustrate the importance of precision in technology development. His ongoing efforts at Panasonic Corporation continue to influence the evolution of manufacturing processes, paving the way for future innovations in the industry.