This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Infocus Corporation. Active years: 2006.
Company Filing History:
Years Active: 2006
Title: Ken Edlow: Innovator in Projection Technology
Introduction
Ken Edlow is a notable inventor based in Lake Oswego, Oregon. He has made significant contributions to the field of projection technology, particularly with his innovative approach to temperature control in projection devices. His work has led to the development of a unique patent that enhances the functionality and efficiency of projection systems.
Latest Patents
Ken Edlow holds a patent for a "Projection device having blower and/or lamp with feedback control." This invention outlines a method for controlling temperature in a projection device by measuring multiple temperatures within the device. The process involves averaging these temperatures to determine an overall temperature, calculating the error between a set-point temperature and the averaged temperature, and automatically adjusting the blower based on this error. Additionally, the patent describes a method for controlling temperature by selectively adjusting signals to both the blower and the lamp, ensuring optimal performance of the projection device.
Career Highlights
Throughout his career, Ken has worked with prominent companies in the technology sector. He has been associated with Infocus Corporation and Seiko Epson Corporation, where he contributed to advancements in projection technology. His experience in these organizations has allowed him to refine his skills and innovate in his field.
Collaborations
Ken has collaborated with talented individuals such as Brian G. Russell and Pamela R. Deshon-Stepp. These partnerships have fostered a creative environment that has led to the development of cutting-edge technologies in projection systems.
Conclusion
Ken Edlow's contributions to projection technology through his innovative patent and collaborations with industry professionals highlight his role as a significant inventor. His work continues to influence the efficiency and effectiveness of projection devices in various applications.
