Tokyo, Japan

Ken Ebihara

This inventor holds 1 USPTO granted patent and 2 EPO patents. Top assignees: Agc Flat Glass North America, Inc., Agc Glass Europe, Agc Inc.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ken Ebihara. Retrieved from https://idiyas.com/inventor/ken-ebihara-ftjhciv9

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Ken Ebihara: Innovator in Antenna Technology

Introduction

Ken Ebihara is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of antenna technology, particularly with his innovative designs that enhance communication systems.

Latest Patents

Ken Ebihara holds a patent for an antenna unit, which includes an antenna unit-equipped window glass and an attachment method for the antenna unit. This antenna unit is designed to be installed facing the window glass of a building. It features a radiating element, a reflective member that directs electromagnetic waves outside the building, and a support unit that securely holds the reflective member. This innovative design allows for improved signal reception and transmission in urban environments.

Career Highlights

Throughout his career, Ken has worked with prominent companies such as AGC Inc. and AGC Glass Europe. His experience in these organizations has allowed him to refine his skills and contribute to advancements in glass and antenna technologies.

Collaborations

Ken has collaborated with talented individuals in his field, including Tetsuya Hiramatsu and Mayu Ogawa. These partnerships have fostered innovation and creativity in their projects.

Conclusion

Ken Ebihara's work in antenna technology exemplifies the impact of innovative thinking in modern communication systems. His contributions continue to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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