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Chiyoda-ku, Japan

Ken Ebihara

USPTO Granted Patents = 6

Average Co-Inventor Count = 2.9

ph-index = 4

Forward Citations = 44(Granted Patents)

Location History:

Chiyoda-ku, JP (2010 - 2011)
Matsudo, JP (2010 - 2011)
Tokyo, JP (2011 - 2012)

Company Filing History:

Asahi Glass Company, Limited

Years Active: 2010-2012

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6 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8168352 - Reflective mask blank for EUV lithography and mask for EUV lithography (2012-05-01),

2. 8029950 - Reflective mask blank for EUV lithography (2011-10-04),

3. 8012653 - Substrate for EUV mask blanks (2011-09-06),

4. 7960077 - Reflective-type mask blank for EUV lithography (2011-06-14),

5. 7712333 - Method for smoothing a surface of a glass substrate for a reflective mask blank used in EUV lithography (2010-05-11),

6. 7678511 - Reflective-type mask blank for EUV lithography (2010-03-16),

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