Ken Ebihara is a prominent inventor based in Chiyoda-ku, Japan. He has made significant contributions to the field of lithography, particularly in the development of reflective masks for extreme ultraviolet (EUV) lithography. With a total of 6 patents to his name, Ebihara continues to push the boundaries of technology in this specialized area.

Latest Patents

Ebihara's latest patents include innovative designs for reflective mask blanks for EUV lithography. One of his notable inventions is a mask for EUV lithography that suppresses the influence of reflected light from regions outside the mask pattern. This advancement is crucial for enhancing the precision of lithographic processes. Another significant patent involves a reflective mask blank that allows for easy control of stress and crystal structure, featuring a substrate with a reflective layer and an absorber layer containing tantalum, nitrogen, and hydrogen.

Career Highlights

Ken Ebihara is currently employed at Asahi Glass Company, Limited, where he applies his expertise in lithography. His work has been instrumental in advancing the technology used in semiconductor manufacturing. His innovative approaches have garnered attention in the industry, making him a key figure in the development of EUV lithography.

Collaborations

Ebihara has collaborated with notable colleagues such as Toshiyuki Uno and Yoshiaki Ikuta. These partnerships have contributed to the successful development of his patents and innovations in the field.

Conclusion

Ken Ebihara's contributions to EUV lithography exemplify his dedication to innovation and technology. His patents reflect a deep understanding of the complexities involved in lithographic processes, positioning him as a leading inventor in this critical area.

This text is generated by artificial intelligence and may not be accurate.

Please report any incorrect information to support@idiyas.com