The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 06, 2011
Filed:
Jun. 24, 2009
Applicants:
Akio Koike, Chiyoda-ku, JP;
Ken Ebihara, Chiyoda-ku, JP;
Inventors:
Akio Koike, Chiyoda-ku, JP;
Ken Ebihara, Chiyoda-ku, JP;
Assignee:
Asahi Glass Company, Limited, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A substrate that is suitable for an EUV mask or an EUV mask blank and excellent in flatness, is provided. A substrate for an EUV mask blank, which is made of a silica glass containing from 1 to 12 mass % of TiO, wherein the surface roughness (rms) in a surface quality area of the substrate is at most 2 nm, and the maximum variation (PV) of the stress in the surface quality area of the substrate is at most 0.2 MPa.
Quick Actions:
Koike, Akio. (2011). Substrate for euv mask blanks (U.S. Patent No. 8012653). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8012653
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile