Oakmont, PA, United States of America

Kelly M Weiler

This inventor holds 1 USPTO granted patent and 2 published patent applications, plus 1 CIPO patent and 3 EPO patents. Top assignee: Howmet Aerospace Inc.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kelly M Weiler. Retrieved from https://idiyas.com/inventor/kelly-m-weiler

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0


 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Kelly M Weiler: Innovator in Metallic Substrate Treatment

Introduction

Kelly M Weiler is a notable inventor based in Oakmont, PA (US). She has made significant contributions to the field of metallic substrate treatment, showcasing her expertise through her innovative patent.

Latest Patents

Weiler holds a patent for "Metallic substrate treatment methods and articles comprising a phosphonate functionalized layer." This patent describes a method that involves contacting a metallic substrate, specifically aluminum or an aluminum alloy, with a fluid to create a phosphonate functionalized layer. The fluid used in this process contains a phosphonate containing acid and a derivative, which plays a crucial role in forming the functionalized layer.

Career Highlights

Kelly M Weiler is currently employed at Howmet Aerospace Inc., where she continues to develop and refine her innovative ideas. Her work focuses on enhancing the properties of metallic substrates, which has important applications in various industries.

Collaborations

Weiler collaborates with her coworker, Ryan N Scott, contributing to advancements in their field through teamwork and shared expertise.

Conclusion

Kelly M Weiler's contributions to metallic substrate treatment highlight her innovative spirit and dedication to advancing technology. Her patent reflects her commitment to improving materials and processes in the aerospace industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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