Beijing, China

Keliang Du

This inventor holds 1 USPTO granted patent. Top assignee: Beijing University of Posts and Telecommunications. Active years: 2023.


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Keliang Du: Innovator in Network Capability Exposure

Introduction

Keliang Du is a prominent inventor based in Beijing, China. He has made significant contributions to the field of network technology, particularly in the area of network capability exposure. His innovative work has led to the development of a unique patent that addresses the needs of modern computing and networking.

Latest Patents

Keliang Du holds a patent for a "Network capability exposure method and device thereof." This patent discloses a method that includes receiving a service request from a third-party device. It involves determining the type of network capability required based on the service request and matching it with a corresponding computing task. The method also includes exposing computing resources from physical devices and providing the necessary network capability to the third-party device. This invention is crucial for enhancing the efficiency and effectiveness of network services.

Career Highlights

Keliang Du is affiliated with the Beijing University of Posts and Telecommunications, where he continues to advance his research and innovation in network technologies. His work has garnered attention for its practical applications and potential to improve network performance.

Collaborations

Keliang Du collaborates with notable colleagues, including Luhan Wang and Yu Liu. Their combined expertise contributes to the advancement of research in network capabilities and related technologies.

Conclusion

Keliang Du's contributions to network capability exposure demonstrate his commitment to innovation in technology. His patent reflects a significant advancement in the field, showcasing his role as a leading inventor in this area.

Profile summary based on public USPTO records.
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