Keith Edward Ypma

Title: Innovations by Keith Edward Ypma

Introduction

Keith Edward Ypma is an accomplished inventor based in Kalispell, MT (US). He has made significant contributions to the field of electrochemical deposition systems, holding two patents that showcase his innovative approach to technology.

Latest Patents

Ypma's latest patents include advancements in electrochemical deposition systems with enhanced crystallization prevention features. These systems are designed to hold an electrochemical deposition fluid containing a metal salt dissolved in water. They incorporate sensors, such as thermometers and concentration sensors, to monitor the characteristics of the fluid. A computer is configured to analyze system data and generate control signals to adjust the fluid's characteristics, preventing crystallization of the metal salt.

Another notable patent focuses on plating and deplating currents for material co-planarity in semiconductor plating processes. This method involves placing a substrate in a plating chamber filled with liquid and applying a current to deposit metal on the substrate. The process includes alternating cycles of forward plating and reverse deplating currents. A model of the substrate is simulated to generate data points that inform the current characteristics, ensuring uniform material formation during plating.

Career Highlights

Keith Edward Ypma is currently employed at Applied Materials, Inc., where he continues to develop innovative technologies in the field of electrochemical deposition. His work has significantly impacted the semiconductor industry, enhancing the efficiency and effectiveness of plating processes.

Collaborations

Ypma collaborates with talented individuals such as Kwan Wook Roh and Xundong Dai, contributing to a dynamic team focused on advancing technology in their field.

Conclusion

Keith Edward Ypma's contributions to electrochemical deposition systems and semiconductor technology highlight his innovative spirit and dedication to advancing the industry. His patents reflect a commitment to solving complex challenges and improving processes in electrochemical applications.