Midland, MI, United States of America

Keith Alan LaChance

This inventor holds 1 USPTO granted patent. Top assignee: Dow Corning Corporation. Active years: 2003.


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 28(Granted Patents)


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: Innovations of Keith Alan LaChance

Introduction

Keith Alan LaChance is an accomplished inventor based in Midland, MI (US). He is known for his innovative contributions to the field of film-forming formulations, particularly in personal care and healthcare applications. His work has led to the development of a unique patent that showcases his expertise and creativity.

Latest Patents

LaChance holds a patent for a "Fast cure film forming formulation." This formulation is designed for depositing a film on a substrate and comprises 5 to 79.9 wt. % of an alkylene trialkoxy terminated polysiloxane, 0.01 to 5 wt. % of a catalyst, and 20 to 94.99 wt. % of a volatile diluent. Additionally, it may include 0.01 to 5 wt. % of an alkoxysilane and 0.1 to 25 wt. % of a filler. The formulations are particularly valuable for creating films used in personal care or healthcare applications.

Career Highlights

LaChance is associated with Dow Corning Corporation, where he has made significant contributions to the field of materials science. His work has been instrumental in advancing the technology behind film-forming formulations, which are essential in various applications.

Collaborations

Throughout his career, LaChance has collaborated with notable colleagues, including David Clayton Gantner and Bartley Dean Maxon. These collaborations have further enriched his work and contributed to the success of his innovations.

Conclusion

Keith Alan LaChance is a prominent inventor whose work in film-forming formulations has made a significant impact in personal care and healthcare applications. His innovative spirit and dedication to advancing technology continue to inspire others in the field.

Profile summary based on public USPTO records.
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