Tokyo, Japan

Keitarou Ogawa

This inventor holds 3 USPTO granted patents. Top assignee: Hitachi High-Tech Corporation. Active years: 2021-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Keitarou Ogawa. Retrieved from https://idiyas.com/inventor/keitarou-ogawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.6

ph-index = 2

Forward Citations = 28(Granted Patents)


Company Filing History:


Years Active: 2021-2024

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3 patents (USPTO):Explore Patents

Title: Keitarou Ogawa: Innovator in Vacuum Processing Technology

Introduction

Keitarou Ogawa is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of vacuum processing technology, holding three patents to his name. His work focuses on enhancing the efficiency and effectiveness of vacuum processing devices.

Latest Patents

Among his latest patents is an innovative operation method for a vacuum processing device. This invention allows for optimal gas flow control by enabling multiple vacuum transfer chambers to communicate through an intermediate chamber. This design enhances the operational capabilities of vacuum processing devices, making them more adaptable to various situations.

Career Highlights

Keitarou Ogawa is currently employed at Hitachi High-Tech Corporation, where he continues to develop cutting-edge technologies. His expertise in vacuum processing has positioned him as a key player in the industry, contributing to advancements that benefit various applications.

Collaborations

Throughout his career, Ogawa has collaborated with notable colleagues, including Ryoichi Isomura and Takahiro Sakuragi. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Keitarou Ogawa's contributions to vacuum processing technology exemplify his dedication to innovation. His patents reflect a commitment to improving device functionality and efficiency. As he continues to work at Hitachi High-Tech Corporation, his impact on the industry is sure to grow.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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