Keita Iimura

Title: Keita Iimura: Innovator in Imprint Technology

Introduction

Keita Iimura is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of imprint technology, particularly in the development of advanced manufacturing methods. His work has implications for various applications, including optics and materials science.

Latest Patents

Iimura holds a patent for an innovative imprint mold, imprint method, wire grid polarizer, and method for manufacturing wire grid polarizer. This patent describes a configuration that includes a main pattern region and a measurement pattern region set on a flexible substrate. The measurement pattern region contains a section within the contour line of the main pattern region. The main pattern features a series of line-shaped main convex patterns arranged at desired intervals, while the measurement pattern consists of line-shaped unit convex patterns also arranged at specific intervals. Notably, the line direction of both the main and measurement patterns is aligned.

Career Highlights

Keita Iimura is currently employed at Dai Nippon Printing Co., Ltd., where he continues to advance his research and development efforts. His work at this esteemed company has allowed him to collaborate with other talented professionals in the field.

Collaborations

Iimura has worked alongside notable colleagues such as Yasuhiro Ookawa and Naoko Nakata. Their combined expertise has contributed to the success of various projects and innovations within the company.

Conclusion

Keita Iimura's contributions to imprint technology and his innovative patent demonstrate his commitment to advancing the field. His work continues to influence the development of new manufacturing techniques and applications.