The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 02, 2018

Filed:

Jul. 30, 2015
Applicant:

Dai Nippon Printing Co., Ltd., Tokyo, JP;

Inventors:

Yasuhiro Ookawa, Tokyo, JP;

Keita Iimura, Tokyo, JP;

Naoko Nakata, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/30 (2006.01); G03F 7/00 (2006.01); B05D 3/00 (2006.01); B29D 11/00 (2006.01); B05D 3/12 (2006.01); B05D 3/06 (2006.01);
U.S. Cl.
CPC ...
G02B 5/3058 (2013.01); B05D 3/007 (2013.01); B05D 3/06 (2013.01); B05D 3/12 (2013.01); B29D 11/00644 (2013.01); G03F 7/0002 (2013.01);
Abstract

A configuration including a main pattern region and a measurement pattern region which are set on one surface of a substrate having flexibility, wherein the measurement pattern region has at least a region disposed inside the contour line of the main pattern region, a main pattern, in which a plurality of line-shaped main convex patterns are arrayed with desired intervals, is disposed in the main pattern region, a measurement pattern, in which a plurality of line-shaped unit convex patterns are arrayed with desired intervals, is disposed in the measurement pattern region, and the line direction of the main pattern and the line direction of the measurement pattern are the same.


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