Tokyo, Japan

Keita Fuchigami

This inventor holds 1 USPTO granted patent. Top assignee: Taiyo Nippon Sanso Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Keita Fuchigami. Retrieved from https://idiyas.com/inventor/keita-fuchigami

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Keita Fuchigami: Innovator in Semiconductor Cleaning Technology

Introduction

Keita Fuchigami is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor cleaning technology. His innovative approach focuses on enhancing the efficiency and effectiveness of cleaning semiconductor wafers.

Latest Patents

Fuchigami holds a patent for a "Dry ice cleaning apparatus for semiconductor wafers and method for cleaning semiconductor wafers." This invention aims to reduce the amount of particles remaining on the surface of semiconductor wafers. It also addresses the issue of ice formation that can diminish cleaning effects. The apparatus is designed to continuously and effectively clean a large number of semiconductor wafers.

Career Highlights

Keita Fuchigami is associated with Taiyo Nippon Sanso Corporation, where he applies his expertise in semiconductor technology. His work has been instrumental in advancing cleaning methods that are crucial for maintaining the quality of semiconductor wafers.

Collaborations

Fuchigami collaborates with Yoshiki Yano, a fellow innovator in the field. Together, they work on projects that aim to push the boundaries of semiconductor cleaning technology.

Conclusion

Keita Fuchigami's contributions to semiconductor cleaning technology highlight his role as an innovator in the industry. His patented inventions are paving the way for more efficient cleaning processes in semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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