Location History:
- Kanagawa, JP (1999)
- Kawasaki, JP (2001)
Company Filing History:
Years Active: 1999-2001
Title: Keisuke Okazaki: Innovator in Semiconductor Technology
Introduction
Keisuke Okazaki is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His innovative methods have advanced the manufacturing processes of semiconductor devices, showcasing his expertise and dedication to the industry.
Latest Patents
Okazaki's latest patents focus on the manufacture of semiconductor devices with salicide electrodes. One method he developed involves forming an insulated gate structure with a side wall spacer on a p-type region of a silicon substrate. This method allows for the implantation of arsenic ions in source/drain regions at a controlled dose, ensuring good contact even at scaled-down patterns. Another method includes forming a field oxide film for element isolation and depositing a cobalt film on the silicon surface, which reacts to form cobalt silicide, enhancing the device's performance.
Career Highlights
Throughout his career, Okazaki has been associated with Fujitsu Corporation, where he has played a crucial role in advancing semiconductor technologies. His work has not only contributed to the company's success but has also influenced the broader semiconductor industry.
Collaborations
Okazaki has collaborated with notable colleagues, including Atsuo Fushida and Kenichi Goto. These partnerships have fostered innovation and have led to the development of cutting-edge technologies in semiconductor manufacturing.
Conclusion
Keisuke Okazaki's contributions to semiconductor technology through his patents and collaborations highlight his importance as an inventor in this field. His innovative methods continue to shape the future of semiconductor manufacturing.