Kanagawa, Japan

Keisuke Maeto

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Tanaka Kikinzoku Kogyo K.k.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Keisuke Maeto. Retrieved from https://idiyas.com/inventor/keisuke-maeto

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2024

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Keisuke Maeto: Innovator in Metal Powder Technology

Introduction

Keisuke Maeto is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of electroconductive materials, particularly through his innovative work on metal powders.

Latest Patents

Maeto holds a patent for a metal powder designed for use in electroconductive pastes. The aim of this invention is to provide a low-resistance electrode film. One embodiment of his patent involves a platinum-containing or platinum-alloy-containing metal powder that includes metal elements other than platinum. Notably, the metal elements include calcium, and may also include aluminum and zirconium, with a total content of these elements ranging from 10 to 900 mass ppm.

Career Highlights

Keisuke Maeto is associated with Tanaka Kikinzoku Kogyo K.K., a company known for its advancements in precious metals and materials technology. His work has been instrumental in enhancing the performance of electroconductive pastes used in various applications.

Collaborations

Maeto has collaborated with notable colleagues such as Takuya Hosoi and Akio Nagaoka, contributing to the development of innovative materials and technologies.

Conclusion

Keisuke Maeto's contributions to metal powder technology exemplify the importance of innovation in the field of electroconductive materials. His patent reflects a commitment to advancing technology for practical applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…