Company Filing History:
Years Active: 2015-2016
Title: Keisuke Furuya: Innovator in Semiconductor Technology
Introduction
Keisuke Furuya is a prominent inventor based in Kanagawa, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on improving the performance of semiconductor devices, which are crucial in various electronic applications.
Latest Patents
Furuya's latest patents revolve around a semiconductor device that enhances performance through innovative design. The semiconductor substrate is formed with unit LDMOSFET elements, which have source regions electrically coupled via a first and second source interconnect line. Additionally, the gate electrodes of these elements are interconnected through a first and second gate interconnect line. The design includes drain regions that connect to a back surface electrode via a conductive plug embedded in a trench of the semiconductor substrate. Notably, the first source and gate interconnect lines are thinner than the second source interconnect line, optimizing the overall device performance.
Career Highlights
Keisuke Furuya is currently employed at Renesas Electronics Corporation, a leading company in semiconductor solutions. His role involves research and development, where he applies his expertise to create advanced semiconductor technologies. His contributions have been instrumental in enhancing the capabilities of electronic devices.
Collaborations
Furuya has collaborated with notable coworkers, including Yoshinori Yoshida and Hirokazu Kato. Their teamwork has fostered innovation and led to the successful development of cutting-edge semiconductor technologies.
Conclusion
Keisuke Furuya's work in semiconductor technology exemplifies the impact of innovation in the electronics industry. His patents and collaborations highlight his commitment to advancing technology and improving device performance.