Ichihara, Japan

Keisuke Endo

This inventor holds 1 USPTO granted patent. Top assignee: Mitsui Chemicals, Inc.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Keisuke Endo. Retrieved from https://idiyas.com/inventor/keisuke-endo-jqnyvwvw

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Keisuke Endo: Innovator in Cyclic Olefin-Based Resin Technology

Introduction

Keisuke Endo is a prominent inventor based in Ichihara, Japan. He has made significant contributions to the field of materials science, particularly in the development of cyclic olefin-based resin compositions. His innovative work has led to advancements in optical components and molded products.

Latest Patents

Keisuke Endo holds a patent for a cyclic olefin-based resin composition, which includes a cyclic olefin-based polymer and a hindered amine compound. This compound contains a piperidyl group and a carboxylic acid amide group within the same molecule. This invention enhances the properties of resin materials, making them suitable for various applications.

Career Highlights

Endo is currently employed at Mitsui Chemicals, Inc., where he continues to push the boundaries of material innovation. His work has been instrumental in developing new products that meet the demands of modern technology.

Collaborations

He has collaborated with notable colleagues, including Masakatsu Kasuya and Kouichi Kizu, to further enhance the research and development of resin technologies.

Conclusion

Keisuke Endo's contributions to cyclic olefin-based resin technology exemplify the impact of innovative thinking in materials science. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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