Company Filing History:
Years Active: 2022-2025
Title: Keisuke Akinaga: Innovator in Etching Processing Technology
Introduction
Keisuke Akinaga is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of etching processing technology, holding a total of 3 patents. His work focuses on improving methods for etching silicon oxide films, which are crucial in various semiconductor applications.
Latest Patents
One of Akinaga's latest patents is an etching processing method that allows for the etching of a silicon oxide film at a high selection ratio with respect to a silicon nitride film. This method balances a high etching rate of the silicon oxide film with a low etching rate of the silicon nitride film. The process involves dry etching without using plasma, by supplying gas into a process chamber. The method is particularly effective when the wafer is set to a low temperature, optimizing the etching process.
Another notable patent is a gas supply apparatus designed to suppress backflow of process gas during processing inside a chamber. This apparatus includes ports connected to various gas sources and a collective pipe that allows for the effective flow of gases. The design ensures that the purging gas flows through a designated path, enhancing the efficiency of the gas supply during processing.
Career Highlights
Keisuke Akinaga is currently employed at Hitachi High-Tech Corporation, where he continues to innovate in the field of semiconductor processing. His expertise in etching technology has positioned him as a key figure in advancing the capabilities of semiconductor manufacturing.
Collaborations
Akinaga collaborates with notable colleagues such as Yoshifumi Ogawa and Yutaka Kouzuma. Their combined efforts contribute to the ongoing development of advanced technologies in the semiconductor industry.
Conclusion
Keisuke Akinaga's contributions to etching processing technology demonstrate his commitment to innovation in the semiconductor field. His patents reflect a deep understanding of the complexities involved in semiconductor manufacturing, making him a valuable asset to Hitachi High-Tech Corporation and the industry as a whole.