Tokyo, Japan

Keishi Nomura

This inventor holds 1 USPTO granted patent. Top assignee: Nippon Telegraph and Telephone Corporation. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Keishi Nomura. Retrieved from https://idiyas.com/inventor/keishi-nomura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Keishi Nomura: Innovator in Response Style Component Removal Technology

Introduction

Keishi Nomura is a prominent inventor based in Tokyo, Japan. He is known for his innovative contributions to technology, particularly in the field of response style component removal devices. His work has significant implications for improving the accuracy of questionnaire evaluations.

Latest Patents

Nomura holds a patent for a "Response Style Component Removal Device, Response Style Component Removal Method, and Program." This device is designed to remove response styles that do not depend on the content of a questionnaire. It generates a probability of rating values for question items based on data from multiple raters. The device learns various parameters, including the tendencies of raters, question items, and response styles, ultimately producing a probability distribution of rating values.

Career Highlights

Keishi Nomura is affiliated with Nippon Telegraph and Telephone Corporation, where he has made significant strides in his field. His work has been instrumental in advancing technologies that enhance the reliability of survey data.

Collaborations

Nomura collaborates with Shiro Kumano, contributing to the development of innovative solutions in their respective fields.

Conclusion

Keishi Nomura's contributions to the field of response style component removal technology highlight his role as a leading inventor. His innovative patent reflects a commitment to improving data accuracy in questionnaire evaluations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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