Company Filing History:
Years Active: 1992-1995
Title: Keiko Tadano: Innovator in Pattern Forming Technology
Introduction
Keiko Tadano is a prominent inventor based in Kodaira, Japan. She has made significant contributions to the field of pattern forming materials and processes. With a total of 2 patents, her work has garnered attention in various industries.
Latest Patents
Keiko's latest patents focus on a novel pattern forming material and the process for forming patterns using this material. The technology involves a medium, such as a polymer or compound, that exhibits reactivity for changing solubility in an alkali aqueous solution through a reaction catalyzed by an acid. Additionally, the acid precursor is an alkylsulfonic acid ester derived from a compound containing at least two phenolic hydroxyl groups. This innovative approach allows for precise pattern formation on substrates.
Career Highlights
Throughout her career, Keiko has worked with notable companies, including Hitachi, Ltd. and Hitachi Chemical Company, Ltd. Her experience in these organizations has contributed to her expertise in the field of materials science and engineering.
Collaborations
Keiko has collaborated with talented individuals such as Takumi Ueno and Hiroshi Shiraishi. These partnerships have further enhanced her research and development efforts in pattern forming technologies.
Conclusion
Keiko Tadano's contributions to the field of pattern forming materials and processes highlight her innovative spirit and dedication to advancing technology. Her patents reflect her commitment to excellence and her impact on the industry.