The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 1995
Filed:
Sep. 13, 1993
Applicant:
Inventors:
Takumi Ueno, Hachioji, JP;
Hiroshi Shiraishi, Hachioji, JP;
Nobuaki Hayashi, Saitama, JP;
Emiko Fukuma, Wako, JP;
Keiko Tadano, Kodaira, JP;
Assignees:
Hitachi, Ltd., Tokyo, JP;
Hitachi Chemical Company, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C / ; C07C / ;
U.S. Cl.
CPC ...
558 46 ;
Abstract
A pattern can be formed on a substrated using a pattern forming material comprising (a) a medium, e.g. a polymer or compound, having reactivity for changing solubility in an alkali aqueous solution by a reaction using an acid as a catalyst, and (b) as an acid precursor an alkylsulfonic acid ester obtained from a compound having at least two phenolic hydroxyl groups.
Ueno, Takumi. (1995). Pattern forming material and process for forming pattern using the same (U.S. Patent No. 5470996). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5470996
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile