This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Fuji Xerox Co., Ltd.. Active years: 2012.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2012
Title: Keiko Ono: Innovator in Electrostatic Charging Technology
Introduction
Keiko Ono is a prominent inventor based in Kanagawa, Japan. She has made significant contributions to the field of electrostatic charging technology, holding a total of 2 patents. Her work has been instrumental in advancing the functionality and efficiency of various devices.
Latest Patents
Keiko Ono's latest patents include innovative designs for a conductive member and an electrostatic charging member. The conductive member patent describes a structure that consists of a substrate, an elastic layer, and a surface layer with a unique sea/island configuration. This design incorporates a sea portion made of a first resin and an island portion containing a second resin, with carbon black integrated into the island portion. The electrostatic charging member patent outlines a base material with an outermost layer that contains a porous filler and resin, achieving a gel fraction of at least about 50% and a surface roughness Rz ranging from about 2 µm to about 20 µm.
Career Highlights
Keiko Ono is currently employed at Fuji Xerox Co., Ltd., where she continues to innovate and develop new technologies. Her expertise in electrostatic charging devices has positioned her as a key player in her field.
Collaborations
Throughout her career, Keiko has collaborated with notable colleagues, including Takuro Hoshio and Kenji Inoue. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies.
Conclusion
Keiko Ono's contributions to electrostatic charging technology exemplify her dedication to innovation. Her patents reflect her commitment to enhancing device performance and functionality. Her work continues to influence the industry and inspire future advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile