Tokyo, Japan

Keiko Aita

This inventor holds 4 USPTO granted patents and 3 EPO patents. Top assignee: Kureha Corporation. Active years: 2021-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Keiko Aita. Retrieved from https://idiyas.com/inventor/keiko-aita-ww6gib9v

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

 

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2021-2024

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4 patents (USPTO):Explore Patents

Title: Keiko Aita: Innovator in Piezoelectric Technology

Introduction

Keiko Aita is a prominent inventor based in Tokyo, Japan. She has made significant contributions to the field of piezoelectric materials, holding a total of 4 patents. Her work focuses on developing advanced piezoelectric body films that enhance performance and reliability.

Latest Patents

Aita's latest patents include innovative technologies such as a piezoelectric body film, a piezoelectric body film production method, and a piezoelectric body device. These inventions aim to provide a piezoelectric body film that can suppress the decrease in the piezoelectric constant d. The films are made from fluororesin, which contains a repeating unit derived from vinylidene fluoride. The piezoelectric constant of these films is designed to be 20 pC/N or greater, with specific thermal properties that ensure stability under varying conditions.

Career Highlights

Keiko Aita is currently employed at Kureha Corporation, where she continues to push the boundaries of piezoelectric technology. Her work has been instrumental in advancing the applications of piezoelectric materials in various industries.

Collaborations

Aita collaborates with notable colleagues such as Nobufumi Sato and Kazuyuki Kanno, contributing to a dynamic research environment that fosters innovation.

Conclusion

Keiko Aita's contributions to piezoelectric technology exemplify her dedication to innovation and excellence in her field. Her patents reflect a commitment to enhancing the performance of materials that are crucial for modern applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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