Keiki Nagai

Title: Keiki Nagai: Innovator in Semiconductor Manufacturing

Introduction

Keiki Nagai is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative methods and techniques. His work has been instrumental in advancing the technology used in semiconductor devices.

Latest Patents

Nagai holds a patent for a method of manufacturing semiconductor devices using thermal nitride films as gate insulating films. This patent describes a process where a thermal nitride film is formed as a gate insulating film on a silicon substrate. After the gate electrode material is applied to the insulating film, it is patterned to create gate electrodes. Following the processing of these electrodes, a portion of the gate insulating film, excluding the area beneath the gate electrodes, is removed. Additionally, an insulating film, known as a post oxidation film, is formed on the side walls and upper surfaces of the stacked gate structures, as well as on the exposed main surface of the silicon substrate, utilizing a thermal oxidation method.

Career Highlights

Keiki Nagai is associated with Kabushiki Kaisha Toshiba, a leading company in the technology sector. His work at Toshiba has allowed him to explore and develop innovative solutions in semiconductor technology. His expertise and dedication have contributed to the company's reputation for excellence in the industry.

Collaborations

Nagai has collaborated with notable colleagues, including Wakako Moriyama and Naoki Kai. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Keiki Nagai's contributions to semiconductor manufacturing highlight his role as a key innovator in the field. His patent and collaborative efforts reflect his commitment to advancing technology and improving manufacturing processes.