This inventor holds 2 USPTO granted patents. Top assignee: Hitachi Chemical Company, Ltd.. Active years: 1985.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1985
Title: Keijiro Honda: Innovator in Photosensitive Film Technology
Introduction
Keijiro Honda is a notable inventor based in Hitachi, Japan. He has made significant contributions to the field of photosensitive film technology. With a total of 2 patents, his work focuses on improving the processes involved in developing and peeling alkali-type photosensitive films.
Latest Patents
Honda's latest patents include innovative methods for regenerating solutions used in the development and peeling of alkali-type photosensitive films. The first patent describes a process where a developing or peeling solution is regenerated by introducing one or more reagents and a gas. This method allows for the deposition of the suspension in a floating state, which is then removed by a skimmer. The treated solution can be partially or wholly extracted from the system. The second patent outlines a similar process, emphasizing the efficiency and effectiveness of the regeneration method for alkali-type photosensitive films.
Career Highlights
Keijiro Honda is associated with Hitachi Chemical Company, Ltd., where he has been instrumental in advancing the company's technological capabilities. His expertise in photosensitive film technology has positioned him as a key figure in the industry.
Collaborations
Throughout his career, Honda has collaborated with notable colleagues such as Seiji Kinoda and Susumu Takahashi. These partnerships have fostered innovation and contributed to the development of new technologies in their field.
Conclusion
Keijiro Honda's contributions to the field of photosensitive film technology are significant and impactful. His innovative patents and collaborations highlight his dedication to advancing this area of research. His work continues to influence the industry and pave the way for future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile