Tokyo, Japan

Keiichiro Senda

This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Keiso Co., Ltd.. Active years: 2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Keiichiro Senda. Retrieved from https://idiyas.com/inventor/keiichiro-senda

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 20(Granted Patents)


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: Keiichiro Senda: Innovator in Flow Rate Control Technology

Introduction

Keiichiro Senda is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of flow rate control technology. His innovative designs have the potential to enhance various industrial applications.

Latest Patents

Senda holds a patent for a flow rate control valve and flow rate control system. This invention features a flow rate control valve that comprises a driver, which rotates a rotary shaft to adjust the opening degree of a valve body. The driver is an ultrasonic motor that includes a stator with piezoelectric elements and a rotor that is resiliently pressed against the stator.

Career Highlights

Keiichiro Senda is associated with Tokyo Keiso Co., Ltd., where he applies his expertise in developing advanced flow control solutions. His work has been instrumental in improving the efficiency and reliability of fluid management systems.

Collaborations

Senda has collaborated with notable colleagues, including Yasushi Watanabe and Hiroshi Fujita. Their combined efforts have contributed to the advancement of technology in their field.

Conclusion

Keiichiro Senda's innovative work in flow rate control technology exemplifies the impact of dedicated inventors in enhancing industrial processes. His contributions continue to influence the development of efficient fluid management systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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