This inventor holds 1 USPTO granted patent. Top assignees: Japan Science and Technology Agency, Osaka Prefecture University. Active years: 2013.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:

Years Active: 2013
Title: Keiichi Otsuka: Innovator in Exhaust Gas Processing
Introduction
Keiichi Otsuka is a notable inventor based in Toyonaka, Japan. He has made significant contributions to the field of exhaust gas processing, particularly through his innovative methods and apparatuses. His work focuses on improving the efficiency and effectiveness of exhaust gas treatment systems.
Latest Patents
Otsuka holds a patent for a "Method and apparatus for processing exhaust gas." This invention discloses a method and apparatus that enable the suppression of pH decrease and the increase of oxidation-reduction potential (ORP) in a mixture of an aqueous solution of a reducing agent and an aqueous alkali solution. The system is designed to operate continuously for extended periods while preventing the deterioration of the mixed aqueous solution. The method involves measuring the ORP and pH of the solution and supplying fresh aqueous solutions as needed to maintain these parameters within predetermined ranges.
Career Highlights
Throughout his career, Keiichi Otsuka has worked with esteemed institutions such as Osaka Prefecture University and the Japan Science and Technology Agency. His research and development efforts have significantly advanced the understanding and application of exhaust gas processing technologies.
Collaborations
Otsuka has collaborated with notable colleagues, including Masaaki Okubo and Toshiaki Yamamoto. Their combined expertise has contributed to the successful development of innovative solutions in the field.
Conclusion
Keiichi Otsuka's contributions to exhaust gas processing highlight his role as a key innovator in this important area of environmental technology. His patented methods and collaborative efforts continue to influence advancements in the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile