This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Electron Limited. Active years: 2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2025
Title: Keiichi Iobe: Innovator in Substrate Processing Technology
Introduction
Keiichi Iobe is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of substrate processing technology. His innovative work has led to the development of a unique patent that addresses critical aspects of temperature control in substrate processing apparatuses.
Latest Patents
Iobe holds a patent for a substrate processing apparatus, temperature control method of the substrate processing apparatus, and a program for controlling the substrate processing apparatus. This invention includes a substrate processing apparatus that features a mounting table designed to hold a substrate within a vacuum processing container. Additionally, it incorporates a heat transfer gas container positioned behind the mounting table, which is cooled by a refrigerator. The control device is engineered to manage the heating of the refrigerator based on the temperature of a control point located near the refrigerator, allowing for precise temperature regulation.
Career Highlights
Keiichi Iobe is associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at the company has been instrumental in advancing substrate processing technologies. Iobe's innovative approach has not only enhanced the efficiency of substrate processing but has also contributed to the overall performance of semiconductor devices.
Collaborations
Iobe has collaborated with notable colleagues, including Toshiharu Hirata and Manabu Nakagawasai. Their combined expertise has fostered a collaborative environment that encourages innovation and the development of cutting-edge technologies in the field.
Conclusion
Keiichi Iobe's contributions to substrate processing technology exemplify the impact of innovation in the semiconductor industry. His patent reflects a commitment to enhancing processing efficiency and temperature control, marking him as a significant figure in his field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile