Fuji, Japan

Kei Tomeba



Average Co-Inventor Count = 2.9

ph-index = 3

Forward Citations = 39(Granted Patents)


Location History:

  • Fuji, JP (2001 - 2011)
  • Tokyo, JP (2013)

Company Filing History:


Years Active: 2001-2013

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6 patents (USPTO):Explore Patents

Title: Kei Tomeba: Innovator in Photosensitive Resin Technology

Introduction

Kei Tomeba is a prominent inventor based in Fuji, Japan, known for his contributions to the field of photosensitive resin compositions. With a total of 6 patents to his name, he has made significant advancements that enhance the efficiency and processability of materials used in printing technologies.

Latest Patents

Tomeba's latest patents focus on innovative photosensitive resin compositions. One of his notable inventions addresses the need for a photosensitive resin composition that maintains good processability at relatively low temperatures near room temperature. This invention effectively removes debris generated during the laser engraving process of printing plates. The composition includes a resin with a number average molecular weight of 1,000 or more and ultrafine particles with a specific size range, ensuring optimal viscosity for practical applications. Another significant patent involves a photosensitive resin composition designed for laser engravable printing substrates, which incorporates a polymerizable unsaturated group and an organosilicon compound, enhancing the overall performance of the material.

Career Highlights

Throughout his career, Kei Tomeba has worked with notable companies, including Asahi Kasei Chemicals Corporation and Asahi Kasei Kogyo Kabushiki Kaisha. His experience in these organizations has allowed him to refine his expertise in resin technology and contribute to various innovative projects.

Collaborations

Tomeba has collaborated with esteemed colleagues such as Hiroshi Yamada and Masahisa Yokota. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies in the field of photosensitive resins.

Conclusion

Kei Tomeba's work in photosensitive resin compositions showcases his innovative spirit and dedication to advancing technology in printing applications. His patents reflect a commitment to improving process efficiency and material performance, making him a significant figure in the industry.

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